Time-of-Flight Secondary Ion Mass Spectrometry (ToF SIMS) is a very sensitive and powerful tool, used for molecular Surface Analysis (molecular information on the first monolayer), molecular or elemental Chemical Imaging (lateral resolution 0.1 µm) , and molecular and elemental Depth Profiling (up to 10-15 µm, nm z resolution)

Samples analyzed: all UHV compliant materials
Insulators, polymers, organic products, biological samples, powders, glass, semiconductor, metal, alloys 
  • High mass resolution (< 10.000)
  • High Precision (< 10 ppm)
  • Mass detection (< 15000 D)
  • Analyzed depth from 0,2 to 0,5 nm (1 monolayer)
  • High Lateral Resolution  (down to 0.1 µm)
  • Multiple Ion Sources : Bi et clusters (Bi3, Bi5) for analysis ; O2 , Cs and GCIS for abrasion
  • Cold finger (for volatile compounds on materials surface or for depth profiles on materials containing mobile elements as Li)
  • Maximum sample dimensions : -L x l : 60 x 60 mm², thickness 10 mm, weight < 100 g